We service as a wafer foundry providing various services to deposit films on silicon wafers meeting customers’ needs since the establishment of 1998 throughout. Our deposition process service include oxide film, which enjoys the highest demand in the industry today ,and nitride film. In addition, we respond to the diverse needs of customers by creating films of different thickness, from common thin films to thick ones. We hold patents of producing thick films. In recent years, the demand for SOI wafers which we applied our original processing technologies are growing. We have received a lot of inquiries about it both products and testing. In addition, such a needs increases from overseas custmers and receives much needs at home and abroad. On the other hand, we may face much difficulty including the decrease in consumption by various factors such as the exchange rate. Under the circumstances, we will streamline its overall operations and actively improve its processing technologies to meet the quality demand of its customers. We will continue to thrive in our businesses and would appreciate your continued support.
President/CEO Masahiro Kawasaki